Infrared Characterization For Microelectronics

Couverture
World Scientific, 1 oct. 1999 - 172 pages
Most of the books on infrared characterization are for applications in chemistry and no book has been dedicated to infrared characterization for microelectronics. The focus of the book will be on practical applications useful to the production line and to the research and development of microelectronics. The background knowledge and significance of doing a particular type of infrared measurement will be discussed in detail. The principal purpose of the book is to serve as a useful handbook for practising engineers and scientists in the field of microelectronics.
 

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Table des matières

Chapter 1 INTRODUCTION TO INFRARED SPECTROSCOPY
1
Chapter 2 THE PROPERTIES OF INFRARED TRANSPARENT SUBSTRATES
15
Chapter 3 THE MEASUREMENT OF OXYGEN AND CARBON AND OTHER IMPURITIES IN SILICON
25
Chapter 4 THE MEASUREMENT OF EPITAXIAL LAYER THICKNESS
45
Chapter 5 THE CHARACTERIZATION OF SILICON DIOXIDE AND SILICON NITRIDE THIN FILMS
55
Chapter 6 THE CHARACTERIZATION OF PSG BPSG SOG AND OTHER GLASSES
87
Chapter 7 THE CHARACTERIZATION OF AMORPHOUS SILICON AND RELATED MATERIALS
105
Chapter 8 MISCELLANEOUS APPLICATIONS OF INFRARED SPECTROSCOPY TO MICROELECTRONICS
125
Appendix A THE APPLICATION OF MULTIVARIATE CALIBRATION TO INFRARED SPECTROSCOPY FOR MICROELECTRONICS
155
Index
159
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