Synthetic Methods of Organometallic and Inorganic ChemistryThe last in this ten-volume series, this text covers the most important standard compounds to be generally used in laboratories engaged in all branches of synthetic chemistry. |
Avis des internautes - Rédiger un commentaire
Aucun commentaire n'a été trouvé aux emplacements habituels.
Table des matières
| 2 | |
| 42 | |
| 64 | |
| 72 | |
| 78 | |
| 79 | |
Chapter 6 | 94 |
Chapter 9 | 114 |
Chapter 13 | 149 |
Chapter 14 | 158 |
Chapter 15 | 167 |
Chapter 16 | 180 |
Chapter 18 | 194 |
Chapter 19 | 202 |
Chapter 20 | 209 |
Index | 225 |
Autres éditions - Tout afficher
Synthetic Methods of Organometallic and Inorganic Chemistry ..., Partie 3 Wolfgang A. Herrmann,Georg Brauer Affichage d'extraits - 2000 |
Synthetic Methods of Organometallic and Inorganic Chemistry: Catalysis Wolfgang A. Herrmann Affichage d'extraits - 2002 |
Expressions et termes fréquents
3JH H acetonitrile acid active added dropwise air and moisture alkenes Anal Angew aqueous argon argon or nitrogen arom aromatic aryl atmosphere of pure autoclave calcd catalyst precursor Caution CH3CN Chem colloid complexes compound is moisture crude product crystals cyclopentadiene dichloromethane diethyl ether dissolved distilled Enantioselective Engl ethylene evaporated exclusion of air F. E. KUhn filtered filtration H NMR hexane HNMR Hydroformylation hydrogen peroxide Inorg ligands manipulations are performed mbar metal metallocene methanol mixture is stirred mmol moisture sensitive moisture usually nitrogen using Schlenk NMR CDC13 Organomet Organometallics oxidation palladium pcaH pentane performed under rigorous phosphine Polymerization powder precipitate Procedure Properties The compound pure argon reaction mixture removed under vacuum residue rhenium(VII Rhodium rigorous exclusion room temperature Schlenk techniques solid solvent solvent is removed stirred at room substrate suspension Synthesis toluene W. A. Herrmann washed yellow Yield

