Infrared Characterization for Microelectronics
World Scientific, 1999 - 160 pages
Most of the books on infrared characterization are for applications in chemistry and no book has been dedicated to infrared characterization for microelectronics. The focus of the book will be on practical applications useful to the production line and to the research and development of microelectronics. The background knowledge and significance of doing a particular type of infrared measurement will be discussed in detail. The principal purpose of the book is to serve as a useful handbook for practising engineers and scientists in the field of microelectronics.
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THE MEASUREMENT OF OXYGEN AND
THE MEASUREMENT OF EPITAXIAL LAYER
Stabilization of PSG and BPSG by annealing
THE CHARACTERIZATION OF AMORPHOUS
Autres éditions - Tout afficher
a-C:H films absorption coefficient acceptor American Institute amorphous silicon Appl application of infrared atoms boron nitride BPSG BPSG films C-O complex calibration chemical vapor deposition concentration detected devices discussed ECR PECVD Electrochem Electron epilayer epitaxial fluorine-doped silicon dioxide frequency FTIR spectra gallium arsenide Ge-H heavily doped hydrogen hydrogen content IEEE impurities infrared absorption peaks infrared absorption spectroscopy infrared spectroscopy infrared spectrum Institute of Physics integrated circuits Lett low temperature measurement method microelectronics moisture molecules MOSFET nitrogen oxide films oxygen oxygen precipitation p-type PECVD silicon nitride phonon Phys polyimide Raman Raman spectroscopy refractive index Reprinted with permission sample semi-insulating GaAs wafers semiconductor shown in Fig Si-F Si-H bonds Si-N Si-O Si-OH silane silicon dioxide silicon dioxide films silicon nitride films silicon wafers SIMOX SOG films Solid spectrometer substrate surface symmetric stretch Technol vibration modes Vibrational Spectroscopy wavelength wavenumber Wavenumber cm